Atomic Layer Deposition for Semiconductors - - Books - Springer-Verlag New York Inc. - 9781489979438 - August 23, 2016
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Atomic Layer Deposition for Semiconductors Softcover reprint of the original 1st ed. 2014 edition

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This edited volume discusses atomic layer deposition (ALD) for all modern semiconductor devices, moving from the basic chemistry of ALD and modeling of ALD processes to sections on ALD for memories, logic devices, and machines. The section on ALD for logic devices covers both front-end of the line processes and back-end of the line processes.

273 pages, 89 black & white illustrations, 81 colour illustrations, 3 black & white tables, 1 colour

Media Books     Paperback Book   (Book with soft cover and glued back)
Released August 23, 2016
ISBN13 9781489979438
Publishers Springer-Verlag New York Inc.
Pages 263
Dimensions 234 × 155 × 18 mm   ·   482 g
Language English  
Editor Hwang, Cheol Seong

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